DocumentCode
3140496
Title
Processing of ZnO thin films for SAW devices
Author
Hall, D.A. ; Kutepova, V.P.
Author_Institution
Mater. Sci. Centre, Univ. of Manchester Inst. of Sci. & Technol., UK
fYear
1997
fDate
35748
Firstpage
42583
Abstract
Summary form only given. The aim of the present study was to evaluate the potential of thin film SAW devices as strain sensors. ZnO (zinc oxide) was identified as the most suitable piezoelectric thin film material, on the basis of its relatively high SAW coupling factor and low acoustic losses. Other factors, including the processing techniques and temperatures required for film growth, were also considered in making this decision. ZnO thin films were deposited by RF magnetron sputtering onto (100) oriented Si wafers. The use of intermediate layers of SiO2 and Al were also investigated for temperature compensation and for enhancement of the coupling factor KSAW respectively. The influence of the substrate type and processing parameters on the film structure, microstructure and electrical resistivity will be reported. The design and performance of prototype 1-port SAW resonators based on the ZnO thin films will also be described
Keywords
zinc compounds; 1-port SAW resonators; RF magnetron sputtering; SAW devices; Si; ZnO; coupling factor enhancement; electrical resistivity; film growth; film structure; intermediate layers; low acoustic losses; microstructure; piezoelectric thin films; processing parameters; processing techniques; relatively high SAW coupling factor; strain sensors; substrate type; temperature compensation;
fLanguage
English
Publisher
iet
Conference_Titel
Electro-technical Ceramics - Processing, Properties and Applications (Ref. No: 1997/317), IEE Colloquium on
Conference_Location
London
Type
conf
DOI
10.1049/ic:19971053
Filename
660642
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