DocumentCode
316466
Title
Electron emission characteristics of boron nitride films synthesized by plasma-assisted chemical vapor deposition
Author
Sugino, Takashi ; Kawasaki, Seiji ; Tanioka, Kazuhiko ; Shirafuji, Junji
Author_Institution
Department of Electrical Engineering, Osaka University
fYear
1997
fDate
17-21 Aug. 1997
Firstpage
123
Lastpage
126
Keywords
Boron; Chemical vapor deposition; Electron emission; Optical films; Plasma applications; Plasma chemistry; Plasma properties; Plasma sources; Stimulated emission; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 1997. Technical Digest., 1997 10th International
Conference_Location
Kyongju, Korea
Print_ISBN
0-7803-3786-7
Type
conf
DOI
10.1109/IVMC.1997.627401
Filename
627401
Link To Document