DocumentCode
3167117
Title
Micro field emitter with nano-pillarets formed by RIE of photoresist
Author
Baba, A. ; Yoshida, T. ; Asano, T.
Author_Institution
Center for Microelectron. Syst., Kyushu Inst. of Technol., Fukuoka, Japan
fYear
2002
fDate
6-8 Nov. 2002
Firstpage
332
Lastpage
333
Abstract
We report for the first time the fabrication and emission characteristics of a gated micro-cold cathode whose emitter is made of nano-pillarets. We successfully fabricated the gated nano-pillarets emitter using a self-aligned formation process and the field electron emission from the gated emitter was demonstrated.
Keywords
cathodes; electron field emission; photoresists; sputter etching; RIE; fabrication; field electron emission; gated micro-cold cathode; micro field emitter; reactive ion etching; self-aligned formation process; Apertures; Cathodes; Electrodes; Electron emission; Etching; Fabrication; Organic materials; Plasma displays; Resists; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-031-3
Type
conf
DOI
10.1109/IMNC.2002.1178678
Filename
1178678
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