DocumentCode
3171216
Title
TFT-LCD manufacturing technology — current status and future prospect —
Author
Ukai, Yasuhiro
Author_Institution
Sony Corp., Atsugi
fYear
2007
fDate
16-20 Dec. 2007
Firstpage
29
Lastpage
34
Abstract
Current status and future prospect in the thin-film-transistor liquid crystal display (TFT-LCD) manufacturing technology are reviewed. Amorphous Si (a-Si) and low temperature poly-Si (LTPS) TFT-LCDs are discussed in this paper. Each device structure and fabrication process is outlined. Future trends in TFT-LCD manufacturing technologies are described in terms of substrate size enlargement and In-cell integration technologies.
Keywords
amorphous semiconductors; liquid crystal displays; thin film devices; TFT-LCD manufacturing technology; amorphous Si; low temperature poly-Si; thin-film-transistor liquid crystal display; Assembly; Electrodes; Glass; Inspection; Large scale integration; Liquid crystal displays; Manufacturing; Optical polarization; Substrates; Thin film transistors; IPS mode; LTPS-TFT; TFT-LCD; TN mode; VA mode; a-Si TFT; in-cell; system integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Physics of Semiconductor Devices, 2007. IWPSD 2007. International Workshop on
Conference_Location
Mumbai
Print_ISBN
978-1-4244-1728-5
Electronic_ISBN
978-1-4244-1728-5
Type
conf
DOI
10.1109/IWPSD.2007.4472449
Filename
4472449
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