Plasma-etched nanofiber anisotropic conductive films (ACFs) for ultra fine pitch interconnection

Plasma etched nanofiber ACFs were investigated in terms of conductive particle movement and electrical contact properties. For the plasma etched nanofiber ACFs, polyvinylidene fluoride (PVDF) was used as a nanofiber material. Conductive particles were incorporated into nanofibers by an electrospinning method and heat treated nanofiber was plasma etched using O2 plasma to remove insulating polymer layer coated on conductive particles for nanofiber ACF bonding. Plasma etched conductive particle incorporated nanofiber successfully suppressed the free movement of conductive particles during the ACF bonding process and increased the percentage of captured particles after bonding from 35% up to 80% resulting in excellent electrical contact properties.