DocumentCode
3175651
Title
Self-heating effect and characteristic variability of gate-all-around silicon nanowire transistors for highly-scaled CMOS technology (invited)
Author
Huang, R. ; Wang, R.S. ; Zhuge, J. ; Yu, T. ; Ai, Y.J. ; Fan, C. ; Pu, S.S. ; Zou, J.B. ; Wang, Y.Y.
Author_Institution
Inst. of Microelectron., Peking Univ., Beijing, China
fYear
2010
fDate
11-14 Oct. 2010
Firstpage
1
Lastpage
4
Abstract
This paper discusses self-heating effect and variability behavior of GAA SNWTs. Due to the 1-D nature of nanowire and increased phononboundary scattering in GAA structure, the selfheating effect in SNWTs based on bulk substrate is comparable or even a little bit worse than SOI devices, which may limit the ultimate performance of SNWT-based circuits and thus special design consideration is expected. On the other hand, random variation has become a practical problem at nano-scale. The characteristic variability of SNWTs is experimentally extracted and studied in detail. And the impacts of nanowire LER, the diameter-dependent annealing enhanced nanowire SDE-RDF are discussed, as well as the variability impact on SNWT based SRAM cells.
Keywords
CMOS integrated circuits; SRAM chips; elemental semiconductors; nanowires; silicon; silicon-on-insulator; GAA SNWT; SRAM cells; bulk substrate; characteristic variability; gate-all-around silicon nanowire transistors; highly-scaled CMOS technology; phononboundary scattering; random variation; self-heating effect; variability impact; Annealing; Heating; Logic gates; Nanoscale devices; Performance evaluation; Random access memory; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
SOI Conference (SOI), 2010 IEEE International
Conference_Location
San Diego, CA
ISSN
1078-621x
Print_ISBN
978-1-4244-9130-8
Electronic_ISBN
1078-621x
Type
conf
DOI
10.1109/SOI.2010.5641472
Filename
5641472
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