• DocumentCode
    3210638
  • Title

    Application of yield models for semiconductor yield improvement

  • Author

    Dance, Daren L. ; Jarvis, Richard

  • Author_Institution
    SEMATECH, Austin, TX, USA
  • fYear
    1992
  • fDate
    4-6 Nov 1992
  • Firstpage
    237
  • Lastpage
    266
  • Abstract
    Yield models may be applied to increase the yield learning rate in semiconductor manufacture. Detailed equipment models can be used to predict the defect-limited yield from estimates of particles added per wafer pass. These general yield models may be refined to reflect specific processes, equipment, and design rules in more accurate critical area estimates. After validation, refined models can be applied to direct particle reduction and yield improvement efforts amid conflicting priorities. Yield improvements have been demonstrated by applying defect-limited yield models in a production manufacturing facility
  • Keywords
    semiconductor device manufacture; semiconductor process modelling; critical area estimates; defect-limited yield; design rules; direct particle reduction; equipment models; production manufacturing facility; semiconductor manufacture; semiconductor yield improvement; wafer pass; yield learning rate; yield models; Acceleration; Continuous improvement; Inspection; Manufacturing; Microelectronics; Predictive models; Production; Semiconductor device manufacture; Semiconductor device modeling; Yield estimation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Defect and Fault Tolerance in VLSI Systems, 1992. Proceedings., 1992 IEEE International Workshop on
  • Conference_Location
    Dallas, TX
  • ISSN
    1550-5774
  • Print_ISBN
    0-8186-2837-5
  • Type

    conf

  • DOI
    10.1109/DFTVS.1992.224349
  • Filename
    224349