DocumentCode
3211308
Title
Preparation and characterization for nanodiamond thin film for electronic field emission applications
Author
Chen, J. ; Xie, F.Y. ; Xie, W.G. ; Liu, X. ; Zhang, W.H. ; Deng, S.Z. ; Xu, N.S.
fYear
2007
fDate
8-12 July 2007
Firstpage
229
Lastpage
230
Abstract
In this work, we investigated the preparation and characterization of nanodiamond thin films on silicon substrate and then studied the electron field emission. We concluded that nanodiamond surface sp2 or sp3 hybridization play an important role in field emission, and some intrinsic relationship between top surface chemical state and emission feature will be established in our future research.
Keywords
diamond; elemental semiconductors; materials preparation; nanostructured materials; semiconductor thin films; electronic field emission; nanodiamond thin film; semiconductor thin films; silicon substrate; Chemical analysis; Chemical technology; Electron emission; Nanoscale devices; Scanning electron microscopy; Semiconductor thin films; Silicon; Spectroscopy; Sun; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference, 2007. IVNC. IEEE 20th International
Conference_Location
Chicago, IL
Print_ISBN
978-1-4244-1133-7
Electronic_ISBN
978-1-4244-1134-4
Type
conf
DOI
10.1109/IVNC.2007.4481008
Filename
4481008
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