A wafer-scale MEMS and analog VLSI system for active drag reduction

Author

Gupta, Bhusan ; Goodman, Rodney ; Jiang, Fukang ; Tsao, Tom ; Tai, Yu-Chong ; Tung, Steve ; Ho, Chih-Ming

Author_Institution

Dept. of Electr. Eng., California Inst. of Technol., Pasadena, CA, USA

fYear

1996

fDate

9-11 Oct 1996

Firstpage

46

Lastpage

52

Abstract

We describe an analog CMOS VLSI system that can process real-time signals from integrated shear stress sensors to detect regions of high shear stress along a surface in an airflow. The outputs of the CMOS circuit control the actuation of integrated micromachined flaps with the goal of reducing this high shear stress on the surface and thereby lowering the total drag. We have designed, fabricated, and tested components of this system in a wind tunnel in both laminar and turbulent flow regimes with the goal of building a wafer-scale system

Keywords

CMOS analogue integrated circuits; VLSI; aircraft control; analogue processing circuits; drag reduction; laminar flow; microactuators; micromachining; microsensors; real-time systems; shear turbulence; stress control; stress measurement; wafer-scale integration; CMOS circuit; active drag reduction; air transport; aircraft; airflow; analog VLSI system; flap actuation; high shear stress detection; integrated micromachined flaps; integrated shear stress sensors; laminar flow regime; microelectromechanical systems; real-time signal processing; turbulent flow regime; wafer-scale MEMS; wafer-scale system; wind tunnel testing; CMOS process; Circuit testing; Micromechanical devices; Real time systems; Sensor phenomena and characterization; Sensor systems; Signal processing; Stress control; System testing; Very large scale integration;

fLanguage

English

Publisher

ieee

Conference_Titel

Innovative Systems in Silicon, 1996. Proceedings., Eighth Annual IEEE International Conference on

Conference_Location

Austin, TX

ISSN

1063-2204

Print_ISBN

0-7803-3639-9

Type

conf

DOI

10.1109/ICISS.1996.552410

Filename

552410