ILP based leakage optimization during nano-CMOS RTL synthesis: A DOXCMOS Versus DTCMOS perspective

In this paper, an integer linear programming (ILP) based algorithm is presented that considers resource constraints and optimize leakage delay product (LDP) using a precharacterized register transfer level (RTL) library. For nanoscale CMOS (nano-CMOS) circuits leakage is a predominate form of power dissipation. Leakage optimization at the early stage of design cycle, such as during high-level synthesis is quite few. Two techniques, dual-T_ox (DOXCMOS) and dual-V_th (DTCMOS) technology are explored during the high-level synthesis for leakage optimization. The leakage is assumed to be sum of gate-oxide leakage and subthreshold leakage. Register transfer level (RTL) components are characterized for DOXCMOS and DTCMOS technology accounting for process variations, which is an important issue for nanoscale circuits. Experiments were performed on several high-level synthesis benchmark circuits, which show an average reduction of 79% gate leakage and 76% of subthreshold leakage for DOXCMOS and DTCMOS technology, respectively. It is observed that DOXCMOS technology based optimization out performed the results from DTCMOS technology based optimization.