• DocumentCode
    3218574
  • Title

    Reduction of copper oxides via an atmospheric pressure plasma torch

  • Author

    McWilliams, A.J. ; Hudak, S.J. ; Cuomo, J.J.

  • Author_Institution
    Dept. of Mater. Sci. & Eng., North Carolina State Univ., Raleigh, NC, USA
  • fYear
    2009
  • fDate
    1-5 June 2009
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Summary form only given. An atmospheric pressure Radio Frequency (RF) plasma torch has been used in the reduction of surface oxides on bulk copper. A chemically active reducing environment was generated using a hydrogenic plasma. The reduction of copper oxide was investigated over a range of plasma powers and exposure times. Reduced samples were chemically analyzed using X-ray Photoelectron Spectroscopy (XPS), Energy Dispersive X-ray Spectroscopy (EDS) and Scanning Electron Microscopy (SEM). The XPS spectra showed a shift in both the Cu 2p and O Is peaks. These shifts indicate a reduction from copper oxide to metallic copper. Plasma characteristics were analyzed with Optical Emission Spectroscopy (OES) to determine atomic and molecular species present in the plasma. Additional trends on the reduction process from the varying plasma parameters will be discussed. This process gives an alternative contactless and dry method for the removal of copper oxides. It avoids the use of abrasives and harsh acids or chemicals making it suitable for surface treatment in electronics, connections, and welding applications.
  • Keywords
    X-ray photoelectron spectra; plasma radiofrequency heating; plasma torches; scanning electron microscopy; X-ray photoelectron spectroscopy; atmospheric pressure; copper oxides; energy dispersive X-ray spectroscopy; metallic copper; optical emission spectroscopy; plasma torch; radio frequency; scanning electron microscopy; Atmospheric-pressure plasmas; Atom optics; Chemical analysis; Copper; Plasma chemistry; Plasma properties; Plasma x-ray sources; Radio frequency; Scanning electron microscopy; Spectroscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science - Abstracts, 2009. ICOPS 2009. IEEE International Conference on
  • Conference_Location
    San Diego, CA
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-4244-2617-1
  • Type

    conf

  • DOI
    10.1109/PLASMA.2009.5227645
  • Filename
    5227645