Surface-conduction electron emission from W-Mo-Si thin film

This investigation proposes to deposit a ternary material W-Mo-Si as the conductive films for surface-conduction electron emitters. The components of this ternary film can be controlled by changing the sputtering targets and adjusting the sputtering power of the different targets. This study mainly analyses the electron emission of the co-sputtering using a W-Mo-Si target and Mo target. The micro-analysis about the W-Mo-Si film structure after the electro-forming process is carried out with SEM. Results show that there are many anomalous nanoparticles, electrons can tunnel between the nanoparticles and then be attracted by the anode voltage as the emission current.