Fabrication of carbon-based field emitters using a stamp technology

Author

Baba, Akiyoshi ; Hizukuri, Masafumi ; Iwamoto, Masakazu ; Asano, Tanemasa

Author_Institution

Center for Microelectron. Syst., Kyushu Inst. of Technol., Fukuoka, Japan

fYear

1999

fDate

6-8 July 1999

Firstpage

182

Lastpage

183

Abstract

We proposed and demonstrated stamp technology, a new and simple method for fabricating carbon-based (photoresist and polyimide) field emitters. It is possible to completely transfer the shape of the mold to emitter materials. In spite of the fact that the emitter is prepared in the wedge shape, emission current up to /spl mu/A was obtained. This new technology is very attractive for large-area devices, since large-area stamping is easily done by using the step and repeat technique.

Keywords

cathodes; electron field emission; moulding; photoresists; polymer films; vacuum microelectronics; 10 MPa to 1.2 GPa; 20 to 250 C; Fowler-Nordheim plots; carbon-based field emitters; emission current stability; fabrication method; high temperature baking; ion irradiation; large-area devices; large-area stamping; mold pressing; mold shape transfer; novolac resin; photoresist; spin coated polyimide; stamp technology; step and repeat technique; wedge shape; Electron emission; Etching; Fabrication; Plasma applications; Plasma stability; Plasma temperature; Polyimides; Pressing; Resins; Resists;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International

Conference_Location

Yokohama, Japan

Print_ISBN

4-930813-97-2

Type

conf

DOI

10.1109/IMNC.1999.797537

Filename

797537