• DocumentCode
    3222504
  • Title

    Giga-era dielectric etch: challenges and solutions

  • Author

    Shan, H.

  • Author_Institution
    Dielectr. Etch Div., Appl. Mater. Inc., Santa Clara, CA, USA
  • fYear
    1999
  • fDate
    6-8 July 1999
  • Firstpage
    214
  • Lastpage
    215
  • Abstract
    Moore´s law has generally guided the semiconductor micro-fabrication for the last three decades. Along this trend, a giga era is approaching: gigabit memory devices and giga Hertz microprocessors will be developed around the millennium. The author first discusses both technological and economical challenges to dielectric etch of the gigaera, from a semiconductor equipment vendor´s point of view, then presents some of recently developed solutions.
  • Keywords
    etching; nanotechnology; dielectric etch; giga Hertz microprocessors; gigabit memory devices; semiconductor micro-fabrication; Art; Dielectric films; Dielectric materials; Etching; Microprocessors; Moore´s Law; Resists; Semiconductor device manufacture; Semiconductor films; Semiconductor materials;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International
  • Conference_Location
    Yokohama, Japan
  • Print_ISBN
    4-930813-97-2
  • Type

    conf

  • DOI
    10.1109/IMNC.1999.797553
  • Filename
    797553