Positional control over nanoparticle deposition into nanoholes

Author

Morakinyo, Moshood K. ; Rananavare, Shankar B.

Author_Institution

Portland State Univ., Portland, OR, USA

fYear

2011

fDate

15-18 Aug. 2011

Firstpage

1677

Lastpage

1682

Abstract

Controlled deposition of metal nanoparticles (NPs) into lithographic patterned nanoholes has been a major challenge. Electrostatic attraction was employed in directing gold NPs of precise size into e-beam lithographically patterned holes. Citrate stabilized gold NPs with a net negative surface charge were deposited on a positively charged well-bottom surface generated by adsorption of long-chain amino-terminated organosilane N-(2-aminoethyl)-11-aminoundecyltrimethoxy- silane (AATMS). Scanning electron microscopy (SEM) results indicate that deposition of NPs into patterned holes is a function of deposition time and NPs concentration. Other factors affecting NP fill fraction are thickness of silane and resist layer and spacing between the nanoholes.

Keywords

adsorption; electron beam lithography; gold; nanofabrication; nanolithography; nanoparticles; organic compounds; scanning electron microscopy; Au; Electrostatic attraction; N-(2-aminoethyl)-11-aminoundecyltrimethoxy-silane; SEM; adsorption; deposition time; fill fraction; lithographic patterned nanoholes; metal nanoparticles; nanoparticle deposition; negative surface charge; positional control; scanning electron microscopy; Electrostatics; Films; Gold; Resists; Scanning electron microscopy; Substrates; Surface treatment; Gold nanoparticles; N-(2-aminoethyl)-11-aminoundecyltrimethoxy- silane; electrostatics; nanoholes;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanotechnology (IEEE-NANO), 2011 11th IEEE Conference on

Conference_Location

Portland, OR

ISSN

1944-9399

Print_ISBN

978-1-4577-1514-3

Electronic_ISBN

1944-9399

Type

conf

DOI

10.1109/NANO.2011.6144458

Filename

6144458