• DocumentCode
    3231488
  • Title

    Electron dynamics and device physics of short-channel HEMTs: transverse-domain formation, velocity overshoot, and short-channel effects

  • Author

    Awano, Yuji ; Kosugi, Makoto ; Kuroda, Shigeru ; Mimura, Takashi ; Abe, Masayuki

  • Author_Institution
    Fujitsu Lab. Ltd., Atsugi, Japan
  • fYear
    1989
  • fDate
    7-9 Aug 1989
  • Firstpage
    46
  • Lastpage
    55
  • Abstract
    The authors simulated the electron dynamics and physics in sub-quarter-micron-gate HEMTs (high electron mobility transistors) and fabricated devices for testing their theories on the short-channel effect. They confirmed near-ballistic electron transport under the gate and predicted transverse-domain formation. They introduce a parameter called the channel aspect ratio, which could serve as a design rule for determining the extent of the short-channel effect. Measurements show that the threshold voltage shift is almost negligible for gates as short as 0.14 μm. Thus, within the range studied, HEMTs do require a special design that would limit their applications
  • Keywords
    carrier density; carrier mobility; high electron mobility transistors; semiconductor device models; 0.14 to 0.25 micron; HEMTs; channel aspect ratio; design rule; device physics; electron dynamics; gate length; high electron mobility transistors; near-ballistic electron transport; short-channel effects; simulation model; threshold voltage shift; transverse-domain formation; velocity overshoot; Electrons; FETs; Fabrication; Gallium arsenide; HEMTs; Laboratories; MODFETs; Particle scattering; Physics; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    High Speed Semiconductor Devices and Circuits, 1989. Proceedings., IEEE/Cornell Conference on Advanced Concepts in
  • Conference_Location
    Ithaca, NY
  • Type

    conf

  • DOI
    10.1109/CORNEL.1989.79820
  • Filename
    79820