• DocumentCode
    3233076
  • Title

    Polycrystallization of pulsed laser deposited BaTiO3 thin films at room temperature by KrF laser annealing

  • Author

    Tomita, Hiroyuki ; Ninomiya, Yutaka ; Ito, Atsushi ; Obara, Minoru

  • Author_Institution
    Dept. of Electr. Eng., Keio Univ., Yokohama, Japan
  • Volume
    1
  • fYear
    1995
  • fDate
    30-31 Oct 1995
  • Firstpage
    304
  • Abstract
    It is necessary to establish the fabrication techniques of high quality BaTiO3 thin films. In the present work, the laser annealing technique was applied to crystallize amorphous BaTiO3 thin films deposited by KrTiO3 laser ablation at room temperature, and the effect of pulsed excimer laser annealing on BaTiO 3 thin films was investigated for the first time
  • Keywords
    barium compounds; excimer lasers; laser beam annealing; optical fabrication; optical films; pulsed laser deposition; BaTiO3; BaTiO3 thin films; KrF; KrF laser annealing; KrTiO3 laser ablation; amorphous BaTiO3 thin films; fabrication techniques; high quality BaTiO3 thin films; laser annealing technique; polycrystallization; pulsed excimer laser annealing; pulsed laser deposited; room temperature; Amorphous materials; Annealing; Crystallization; Laser ablation; Optical device fabrication; Optical pulses; Pulsed laser deposition; Sputtering; Temperature; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics Society Annual Meeting, 1995. 8th Annual Meeting Conference Proceedings, Volume 1., IEEE
  • Conference_Location
    San Francisco, CA
  • Print_ISBN
    0-7803-2450-1
  • Type

    conf

  • DOI
    10.1109/LEOS.1995.484881
  • Filename
    484881
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3233076