DocumentCode
3235140
Title
3D-nanomachining using corner lithography
Author
Berenschot, Erwin ; Tas, Niels R. ; Jansen, Henri V. ; Elwenspoek, Miko
Author_Institution
Transducers Sci. & Technol. Group, Univ. of Twente, Enschede
fYear
2008
fDate
6-9 Jan. 2008
Firstpage
729
Lastpage
732
Abstract
We present a fabrication method to create 3D nano structures without the need for nano lithography. The method, named "corner lithography" is based on conformal deposition and subsequent isotropic thinning of a thin film. The material that remains in sharp concave corners is either used as a mask or directly as structural material. The method is demonstrated for nano scale modifications of pyramidal tips, as well as the creation of suspended nanowires.
Keywords
lithography; machining; nanotechnology; nanowires; 3D nanomachining; 3D nanostructures; concave corner; conformal deposition; corner lithography; isotropic thinning; pyramidal tips; suspended nanowire; Etching; Fabrication; Hafnium; Lithography; Nanowires; Scanning probe microscopy; Silicon; Temperature; Thermal stresses; Wire; 3D; SPM; corner lithography; nanomachining; tip;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano/Micro Engineered and Molecular Systems, 2008. NEMS 2008. 3rd IEEE International Conference on
Conference_Location
Sanya
Print_ISBN
978-1-4244-1907-4
Electronic_ISBN
978-1-4244-1908-1
Type
conf
DOI
10.1109/NEMS.2008.4484432
Filename
4484432
Link To Document