Radiation characteristics of high repetition rate capillary Z-pinch EUV source

Author

Teramoto, Yusuke ; Sato, Hiroto ; Bessho, Kazunori ; Niimi, G. ; Shirai, Takahiro ; Yamatani, Daiki ; Takemura, Tetsu ; Yokota, Toshio ; Paul, Khokan C. ; Kabuki, Kiyoyuki ; Miyauchi, Koji ; Ikeuchi, Mitsuru ; Okubo, Keisuke ; Hotta, Kazuaki ; Yoshioka, M

Author_Institution

Extreme Ultraviolet Lithography Syst. Dev. Assoc., Hiratsuka Res. & Dev. Center, Shizuoka

fYear

2004

fDate

23-26 May 2004

Firstpage

242

Lastpage

245

Abstract

An extreme ultraviolet (EUV) source as a candidate for a light source in next generation lithography systems has been studied. A xenon capillary Z-pinch source was coupled with an all-solid-state magnetic pulse compression (MPC) generator. In order to evaluate the source performance, radiation characteristics such as radiation energy, spectrum and angular radiation distribution were observed, as well as the energy stability at high repetition rate operation. The xenon Z-pinch load was driven by a pulsed current of which peak current and pulse duration were approximately 20 kA and 275 ns, respectively. Changing the pressure condition in the capillary, it was understood that the highest on-axis EUV energy was 4.2 mJ/sr within 2 % bandwidth around 13.5 nm at low-repetition rate. Knowing the effective, usable solid angle of radiation at 34.5 W of EUV power was confirmed at 7 kHz

Keywords

Z pinch; pulse generators; pulsed power supplies; ultraviolet lithography; ultraviolet radiation effects; ultraviolet sources; xenon; 34.5 W; 7 kHz; EUV; MPC; angular radiation distribution; energy stability; extreme ultraviolet source; next generation lithography system; pressure condition changes; pulse duration; radiation characteristics; radiation energy; solid-state magnetic pulse compression generator; xenon Z-pinch load; xenon capillary Z-pinch source; Couplings; Light sources; Lithography; Magnetic materials; Photonic crystals; Pulse compression methods; Pulse generation; Stability; Ultraviolet sources; Xenon;

fLanguage

English

Publisher

ieee

Conference_Titel

Power Modulator Symposium, 2004 and 2004 High-Voltage Workshop. Conference Record of the Twenty-Sixth International

Conference_Location

San Francisco, CA

Print_ISBN

0-7803-8586-1

Type

conf

DOI

10.1109/MODSYM.2004.1433553

Filename

1433553