• DocumentCode
    3237300
  • Title

    Integration of high-gain double heterojunction GaAs bipolar transistors with a LED for optical neural network application

  • Author

    Lin, S.H. ; Kim, Ji H. ; Katz, J. ; Psaltis, D.

  • Author_Institution
    Jet Propulsion Lab., California Inst. of Technol., Pasadena, CA, USA
  • fYear
    1989
  • fDate
    7-9 Aug 1989
  • Firstpage
    344
  • Lastpage
    352
  • Abstract
    A 10×10 array of optical neurons consisting of monolithically integrated DHPTs (double heterojunction phototransistors), DHBTs (double heterojunction bipolar transistors), and LEDs (light-emitting diodes) was fabricated in an AlGaAs/GaAs/AlGaAs double heterostructure. A single DHBT exhibited a current gain as high as 500 with an ideality factor of 1.4. A Darlington transistor pair showed a combined current gain of 4000. The power density of the LED was about 300 W/cm2. The integrated structure, however, showed SCR (silicon controlled rectifier) characteristics, which was attributed to the coupling of a parasitic p-n-p transistor to the n-p-n DHBT. This problem was eliminated by first etching a groove in the semi-insulating substrate between the LED and the Darlington transistor pair and then employing metallization to provide proper connection. However, overall gains for the Darlington transistor pair were low, probably due to the leakage currents caused by surface contamination and the Zn diffusion process
  • Keywords
    III-V semiconductors; aluminium compounds; bipolar integrated circuits; bipolar transistors; gallium arsenide; integrated optoelectronics; light emitting diodes; neural nets; AlGaAs-GaAs-AlGaAs double heterostructure; DHBT; Darlington transistor pair; LED; SCR; Si controlled rectifier; Zn diffusion process; current gain; double heterojunction bipolar transistors; double heterojunction phototransistors; etching; leakage currents; light-emitting diodes; metallization; monolithically integrated DHPT; n-p-n DHBT; optical neural network; parasitic p-n-p transistor; power density; surface contamination; Double heterojunction bipolar transistors; Etching; Gallium arsenide; Integrated optics; Light emitting diodes; Metallization; Neurons; Optical arrays; Phototransistors; Thyristors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    High Speed Semiconductor Devices and Circuits, 1989. Proceedings., IEEE/Cornell Conference on Advanced Concepts in
  • Conference_Location
    Ithaca, NY
  • Type

    conf

  • DOI
    10.1109/CORNEL.1989.79852
  • Filename
    79852