• DocumentCode
    3240275
  • Title

    The accumulation channel driven bipolar transistor (ACBT): a new MOS-gated semiconductor power device

  • Author

    Thapar, Naresh ; Baliga, B.Jayant

  • Author_Institution
    Power Semicond. Res. Center, North Carolina State Univ., Raleigh, NC, USA
  • fYear
    1997
  • fDate
    26-29 May 1997
  • Firstpage
    201
  • Lastpage
    204
  • Abstract
    A new power device called the Accumulation Channel driven Bipolar Transistor (ACBT) which has no parasitic thyristor is described in this paper. Unlike previous MOS-gate devices without a P-base region, the potential barrier to the flow of electrons from N+ emitter into N-drift region in the ACBT is created using the built-in potential of a P-N junction formed along the sidewall and bottom of a shallow trench. The potential barrier height is sufficiently large even at high collector voltages to prevent the direct injection of electrons from N + emitter into the N-drift region. An accumulation layer formed along the deep trench sidewall (when the n-channel MOSFET in the ACBT is turned-on) is the only path for electrons to enter into the N-drift region. This results in high voltage current saturation with wide FBSOA for the ACBT. The ACBT has been successfully fabricated using a unique, self-aligned double trench process
  • Keywords
    accumulation layers; insulated gate bipolar transistors; power transistors; MOS-gated semiconductor power device; N-drift region; P-N junction; accumulation channel driven bipolar transistor; accumulation layer form; deep trench sidewall; high voltage current saturation; potential barrier height; self-aligned double trench process; wide FBSOA; Bipolar transistors; Current density; Electric variables; Electrons; Equivalent circuits; Fabrication; Insulated gate bipolar transistors; MOSFET circuits; Thyristors; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices and IC's, 1997. ISPSD '97., 1997 IEEE International Symposium on
  • Conference_Location
    Weimar
  • ISSN
    1063-6854
  • Print_ISBN
    0-7803-3993-2
  • Type

    conf

  • DOI
    10.1109/ISPSD.1997.601472
  • Filename
    601472