Nonpatterned wafer surface analysis capability performance

In this the study, the calibration and measurement capability of three Wafer Analysis Systems from manufacture X for nonpatterned wafers was measured using the 0.364 μm absolute standard from VLSI Standards Inc. A 0.364 μm diameter absolute standard was chosen because of its high sensitivity level when measured on a bare silicon wafer for this specific system. The experimental procedure used for this study and a continuous quality improvement cycle for maintaining tool calibration are presented as flow charts