• DocumentCode
    3241796
  • Title

    Scaling variance, invariance and prediction of design rule: from 0.25-μm to 0.10-μm nodes in the era of foundry manufacturing

  • Author

    Doong, Kelvin Yih-Yuh ; Ting, J.K. ; Hsieh, Sunnys ; Lin, S.C. ; Shen, Binson ; Guo, J.C. ; Young, K.L. ; Chen, L.C. ; Sun, J.Y.-C. ; Wang, J.K.

  • Author_Institution
    Taiwan Semicond. Manuf. Corp., Shinchu, Taiwan
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    38
  • Lastpage
    42
  • Abstract
    The design rules are categorized into two parts: the primitive and the affiliate ones, to excogitate the variance and invariance among the different technology nodes. The scaling trend was characterized and the process control capabilities of design rules were reviewed. Based on the data of in-line methodology and process physical specification, a novel algorithm is enacted to generate the design rule of next generation. The design rule is disassembled into two parts: one is the criteria of electrical specification, and the others are the variations induced by the process sequences. The variations are modeled as the statistical distributions of in-line datum set. Monte Carlo simulation is used to extract the variations of multiple variable process parameters. Then, the design rules can be derived from the criteria of electrical specification, and the summation of the variations of multiple variable process parameters
  • Keywords
    Monte Carlo methods; VLSI; integrated circuit manufacture; integrated circuit measurement; process control; 0.1 to 0.25 micron; Monte Carlo simulation; design rule; electrical specification; foundry manufacturing; in-line methodology; multiple variable process parameters; process control capabilities; process physical specification; process sequences; scaling trend; scaling variance; statistical distributions; Algorithm design and analysis; Etching; Foundries; Job shop scheduling; Kelvin; Manufacturing industries; Printing; Process control; Semiconductor device manufacture; Statistical distributions;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Statistical Methodology, IEEE International Workshop on, 2001 6yh.
  • Conference_Location
    Kyoto
  • Print_ISBN
    0-7803-6688-3
  • Type

    conf

  • DOI
    10.1109/IWSTM.2001.933822
  • Filename
    933822