• DocumentCode
    3252610
  • Title

    An improved nonlinear DC I–V characteristics model for nanometer range GaAs MESFETs

  • Author

    Islam, M.S. ; Islam, Muhymin ; Hasan, Mohammad Raziul ; Islam, Naeemul S M

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Bangladesh Univ. of Eng. & Technol., Dhaka, Bangladesh
  • fYear
    2009
  • fDate
    23-26 Jan. 2009
  • Firstpage
    1
  • Lastpage
    5
  • Abstract
    An improved nonlinear current-voltage (I-V) characteristics model for nanometer range GaAs MESFETs has been developed. In this regard, Ahmed et al. model for submicron GaAs MESFETs has been modified. In this modification, the effects of both drain-to-source voltage, VDS, and gate-to-source voltage, VGS, on the output conductance, gd, have been incorporated. Moreover, the effect of VGS on the onset of I-V characteristics saturation has been considered. The developed model has been compared to Ahmed et al. model. For this comparison, root mean square (RMS) error technique is employed. An algorithm has also been developed for the optimization of the model parameters. Nanometer range MESFETs of different aspect ratios have been modeled with greater accuracy by the developed model. The model should be a useful tool for the designing of future integrated circuits with nanometer MESFETs.
  • Keywords
    III-V semiconductors; Schottky gate field effect transistors; gallium arsenide; mean square error methods; nanotechnology; semiconductor device models; GaAs; I-V characteristics saturation; drain-to-source voltage; gate-to-source voltage; integrated circuit design; nanometer range MESFET; nonlinear DC model; nonlinear current-voltage characteristics model; output conductance; root mean square error; Circuit simulation; Computational modeling; FETs; Fabrication; Gallium arsenide; Integrated circuit modeling; MESFETs; Microwave devices; Predictive models; Threshold voltage; I–V characteristics; MESFETs; Modeling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    TENCON 2009 - 2009 IEEE Region 10 Conference
  • Conference_Location
    Singapore
  • Print_ISBN
    978-1-4244-4546-2
  • Electronic_ISBN
    978-1-4244-4547-9
  • Type

    conf

  • DOI
    10.1109/TENCON.2009.5395879
  • Filename
    5395879