DocumentCode
3258272
Title
Advanced multispectral, multifusion, polarimetric imaging: from biophotonics to semiconductor wafers inspection and monitoring
Author
Giakos, George C.
Author_Institution
Dept. of Electr. & Comput. Eng., Akron Univ., OH, USA
fYear
2005
fDate
38485
Firstpage
68
Lastpage
73
Abstract
The objective of this study is to present the principles of a novel optical imaging technique, based on all active, multispectral, multifusion, spectral subtraction polarimetric imaging principles, for efficient interrogation of targets surrounded by scattered media, for biophotonics, defense, surface defects, semiconductor wafer inspection and monitoring. The novelty of the imaging principles consists in fusing spectral difference detection principles, with Mueller matrix polarimetric imaging principles, and Stokes polarization parameters. The experimental results indicate clearly that, high-contrast Stokes parameter polarimetric backscattered light spectral image differences, such as degree of linear polarization (DOLP) images, can be obtained from targets embedded in scattered media.
Keywords
bio-optics; biomedical optical imaging; cancer; light polarisation; light scattering; molecular biophysics; patient monitoring; polarimetry; tumours; Mueller matrix polarimetric imaging principle; Stokes polarization parameters; biophotonics; cancer detection; degree of linear polarization image; high-contrast Stokes parameter polarimetric backscattered light; multifusion imaging; multispectral imaging; optical imaging technique; polarimetric imaging; scattered media; semiconductor wafers inspection; semiconductor wafers monitoring; spectral difference detection principle; spectral subtraction polarimetric imaging principle; surface defects; Biophotonics; Cancer detection; Inspection; Light scattering; Monitoring; Optical imaging; Optical polarization; Optical scattering; Particle scattering; Scattering parameters;
fLanguage
English
Publisher
ieee
Conference_Titel
Imaging Systems and Techniques, 2005. IEEE International Workshop on
Print_ISBN
0-7803-8922-0
Type
conf
DOI
10.1109/IST.2005.1594530
Filename
1594530
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