• DocumentCode
    3260294
  • Title

    Fluorine Penetration Suppression By Applying Amorphous Silicon In Wsi Gate Process

  • Author

    Wang, Han-Ching ; Shih, Chun-Hsing ; Jang, Wen-Yueh

  • fYear
    1997
  • fDate
    3-5 Jun 1997
  • Firstpage
    50
  • Lastpage
    51
  • Keywords
    Amorphous silicon; Annealing; CMOS process; Capacitance-voltage characteristics; Contact resistance; Controllability; Design for quality; Etching; Semiconductor films; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, Systems, and Applications, 1997. Proceedings of Technical Papers. 1997 International Symposium on
  • ISSN
    1524-766X
  • Print_ISBN
    0-7803-4131-7
  • Type

    conf

  • DOI
    10.1109/VTSA.1997.614725
  • Filename
    614725
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3260294