• DocumentCode
    3261635
  • Title

    Preparation and characterization for B3.15Nd0.85Ti3O12 thin film by sol-gel process

  • Author

    Zang, Yong-yuan ; Xie, Dan ; Xiao, Ye-hui ; Xue, Kan-Hao ; Ren, Tian-Ling ; Liu, Li-Tian

  • Author_Institution
    Institute of Microelectronics, Tsinghua University, Beijing, 100084, China
  • fYear
    2007
  • fDate
    3-4 June 2007
  • Firstpage
    121
  • Lastpage
    124
  • Abstract
    B3.15Nd0.85Ti3O12 (BNdT) thin films were prepared on Pt(100)/Ti/SiO2/Si(100) substrate by sol-gel process. Dense and uniform films were achieved by rapidly thermal annealing at 750°C. The perovskite crystalline and the microstructure of the thin films were investigated by XRD, SEM, and AFM. The BNdT thin film capacitors with a Pt electrode show excellent ferroelectric properties. Well-saturated polarization-electric field (P-E) switching curves were examined in the BNdT thin films. The remanent polarization and the coercive field were 43¿C/cm2 and 66kv/cm at an applied voltage of 8v, respectively, in the films annealed at 750°C. The dielectric constant and the dissipation factor were 583 and 0.07 respectively, measured at 100KHZ.
  • Keywords
    Capacitors; Crystal microstructure; Crystallization; Ferroelectric films; Polarization; Rapid thermal annealing; Rapid thermal processing; Substrates; Transistors; X-ray scattering; Ferroelectric films; bismuth compounds; ferroelectric materials; ferroelectric memories; polarization;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Semiconductor Technology, 2007. EDST 2007. Proceeding of 2007 International Workshop on
  • Conference_Location
    Tsinghua University
  • Print_ISBN
    1-4244-1098-3
  • Electronic_ISBN
    1-4244-1098-3
  • Type

    conf

  • DOI
    10.1109/EDST.2007.4289793
  • Filename
    4289793