DocumentCode
3261637
Title
Electron-beam-pulse induced time-domain depolarization in plasma deposited hydrogenated carbon-silicon films
Author
Kazimierski, Piotr ; Tyczkowski, Jacek
Author_Institution
Centre of Molecular & Macromolecular Studies, Polish Acad. of Sci., Lodz, Poland
fYear
1995
fDate
10-13 Jul 1995
Firstpage
706
Lastpage
710
Abstract
In this paper an interesting extension of the VPITDD in the domain of shorter polarization times is presented. The results for plasma deposited carbon-silicon films are discussed in details
Keywords
EBIC; carbon compounds; dielectric depolarisation; dielectric polarisation; hydrogen; plasma deposited coatings; semiconductor materials; semiconductor thin films; silicon compounds; transients; SiC:H; electron-beam-pulse induced time-domain depolarization; plasma deposited films; polarization time; semiconductor; transient currents; Aluminum; Current measurement; Electrodes; Electrons; Plasma measurements; Plasma properties; Polymer films; Time domain analysis; Time measurement; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Conduction and Breakdown in Solid Dielectrics, 1995. ICSD'95., Proceedings of the 1995 IEEE 5th International Conference on
Conference_Location
Leicester
Print_ISBN
0-7803-2040-9
Type
conf
DOI
10.1109/ICSD.1995.523078
Filename
523078
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