DocumentCode
3264387
Title
Design Rule Related Defects Formation
Author
Hsieh, Y.F. ; Tsui, B.Y.
fYear
1997
fDate
3-5 June 1997
Firstpage
138
Lastpage
141
Keywords
Amorphous materials; CMOS technology; Crystalline materials; Density measurement; Electronics industry; Implants; Industrial electronics; Ion implantation; Leakage current; Microelectronics;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, Systems, and Applications, 1997. Proceedings of Technical Papers. 1997 International Symposium on
Conference_Location
Taipei, Taiwan
ISSN
1524-766X
Print_ISBN
0-7803-4131-7
Type
conf
DOI
10.1109/VTSA.1997.614745
Filename
614745
Link To Document