DocumentCode
3264608
Title
Micromachined electron tunneling infrared sensors
Author
Kenny, T.W. ; Kaiser, W.J. ; Podosek, J.A. ; Rockstad, H.K. ; Reynolds, J.K.
Author_Institution
Center for Space Microelectron. Technol., California Inst. of Technol., Pasadena, CA, USA
fYear
1992
fDate
22-25 June 1992
Firstpage
174
Lastpage
177
Abstract
The authors describe the development of an improved Golay cell. This sensor is constructed entirely from micromachined silicon components. In this device, a silicon oxynitride (SiO/sub x/N/sub y/) membrane is deflected by the thermal expansion of a small volume of trapped gas. To detect the motion of the membrane, an electron tunneling displacement transducer is used. An improved infrared sensor in which the cantilever was dispensed with altogether, and the rebalance force from the feedback circuit applied to the membrane directly, is described.<>
Keywords
infrared detectors; micromechanical devices; semiconductor technology; silicon; silicon compounds; transducers; tunnelling; Golay cell; SiO/sub x/N/sub y/; electron tunneling displacement transducer; infrared sensors; membrane; micromachined components; micromechanical devices; thermal expansion; trapped gas; Biomembranes; Electron traps; Force feedback; Force sensors; Infrared sensors; Motion detection; Silicon; Thermal expansion; Transducers; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Sensor and Actuator Workshop, 1992. 5th Technical Digest., IEEE
Conference_Location
Hilton Head Island, SC, USA
Print_ISBN
0-7803-0456-X
Type
conf
DOI
10.1109/SOLSEN.1992.228298
Filename
228298
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