DocumentCode
3272057
Title
Fabrication of a gated cold cathode by using the inkjet embedding method
Author
Baba, Akiyoshi ; Asano, Tanemasa
Author_Institution
Center for Microelectron. Syst., Kyushu Inst. of Technol., Fukuoka, Japan
fYear
2005
fDate
25-28 Oct. 2005
Firstpage
278
Lastpage
279
Abstract
In this paper, we report the fabrication method of the gated cold cathode using the inkjet embedding method and field electron emission characteristics of the gated cold cathode. The gated cold cathode was fabricated by combining photolithography and inkjet printing. The photolithography was used to open a gate hole array. The inkjet printing was used to embed carbon black ink into the gate holes.
Keywords
carbon; cathodes; electron emission; gold; ink jet printers; photolithography; carbon black ink; field electron emission; gate hole array; gate holes; gated cold cathode fabrication; inkjet embedding; inkjet printing; photolithography; Anodes; Carbon dioxide; Cathodes; Electron emission; Fabrication; Ink; Lithography; Printing; Surface treatment; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2005 International
Print_ISBN
4-9902472-2-1
Type
conf
DOI
10.1109/IMNC.2005.203846
Filename
1595322
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