• DocumentCode
    3273230
  • Title

    Output properties of HEMT of nanocrystalline/crystalline Si heterojunctions

  • Author

    Shan, Feng ; Wei, Wensheng

  • Author_Institution
    Coll. of Phys. & Electron. Inf. Eng., Wenzhou Univ., Wenzhou, China
  • fYear
    2011
  • fDate
    15-17 April 2011
  • Firstpage
    579
  • Lastpage
    584
  • Abstract
    A kind of high electron mobility transistor (HEMT) of heterojunction with nanocrystalline Si film with crystalline Si layer (nc-Si/c-Si) was designed in this paper. Based on the output current model of HEMT, the influence of densities for interface charge states (n) at junction and mean sizes (d) of nanocrystalline Si in the film on the drain current (IDS) from the devices was analyzed by numerical simulation. The results indicate that IDS of the HEMTs increases with the n and d. Furthermore, the breakdown voltage (VBR) and pinch-off voltage (VP) vary with n and d. In addition, the device transconductance (gm) relates closely to gate voltage (VGS) and n.
  • Keywords
    electric breakdown; high electron mobility transistors; nanostructured materials; HEMT; breakdown voltage; device transconductance; drain current; gate voltage; interface charge states; nanocrystalline silicon heterojunctions; output properties; pinch off voltage; Electric fields; Films; Grain size; HEMTs; Interface states; Logic gates; Silicon; grain sizes; high electron mobility transistor; interface state; nanocrystalline silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electric Information and Control Engineering (ICEICE), 2011 International Conference on
  • Conference_Location
    Wuhan
  • Print_ISBN
    978-1-4244-8036-4
  • Type

    conf

  • DOI
    10.1109/ICEICE.2011.5777254
  • Filename
    5777254