• DocumentCode
    3275926
  • Title

    Polarization rotator terahertz photonic crystal slab waveguide

  • Author

    Bayat, Khadijeh ; Chaudhuri, Sujeet K. ; Safavi-Naeini, Safieddin

  • Author_Institution
    Univ. of Waterloo, Waterloo, ON
  • fYear
    2008
  • fDate
    15-19 Sept. 2008
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    A silicon based periodic asymmetric loaded photonic crystal polarization rotator for THz frequency band has been introduced and analyzed. The polarization rotator structure consists of a single defect line photonic crystal slab waveguide with asymmetrical top cladding layer. The top cladding layer is silicon. To maintain phase matching condition, the top cladding layer is alternated on either side of the defect line periodically. Complete polarization rotation is achieved over the propagation length of 15 lambda, 7.5 mm. A new fabrication technique was developed to realize photonic crystal slab structure on SOI wafer. The fabrication process consists of deep reactive ion etching of the SOI layer and anisotropic wet etching of the handle Si layer.
  • Keywords
    elemental semiconductors; integrated optics; microwave photonics; optical fabrication; optical phase matching; optical polarisers; optical rotation; optical waveguides; photonic crystals; silicon; silicon-on-insulator; sputter etching; SOI wafer; Si; anisotropic wet etching; asymmetrical top cladding layer; deep reactive ion etching; phase matching condition; polarization rotator structure; terahertz frequency band; terahertz photonic crystal slab waveguide; wavelength 7.5 mm; Anisotropic magnetoresistance; Frequency conversion; Loaded waveguides; Optical device fabrication; Partial differential equations; Photonic crystals; Polarization; Silicon; Slabs; Wet etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Infrared, Millimeter and Terahertz Waves, 2008. IRMMW-THz 2008. 33rd International Conference on
  • Conference_Location
    Pasadena, CA
  • Print_ISBN
    978-1-4244-2119-0
  • Electronic_ISBN
    978-1-4244-2120-6
  • Type

    conf

  • DOI
    10.1109/ICIMW.2008.4665597
  • Filename
    4665597