DocumentCode
3282611
Title
Novel fabrication method for high-aspect-ratio suspended parylene structures
Author
Kuo, Wen-Cheng ; Chen, Cheng-Wei
Author_Institution
Dept. of Mech. Eng., Nat. Kaohsiung First Univ. of Sci. & Technol., Kaohsiung, Taiwan
fYear
2011
fDate
20-23 Feb. 2011
Firstpage
585
Lastpage
588
Abstract
This paper is to present a novel and easy fabrication method for suspended high-aspect-ratio parylene structures on a standard silicon wafer. The process employs the concept of creating parylene beams by multiple parylene deposition/removing steps in the trench, releases the structures at the same side of the silicon wafer, and then fabricates soft beams for the requirement of high sensitivity and low stiffness in in-plane motion. By using the proposed process, a test device of free-standing parylene beams with 20 μm in width, 3000μm in span, and 50μm in thickness is fabricated to verify the feasibility of the suspended parylene-based structure design.
Keywords
beams (structures); microfabrication; micromechanical devices; organic compounds; Si; fabrication method; free-standing parylene beams; high-aspect-ratio suspended parylene structures; in-plane motion; multiple parylene deposition; size 20 mum; size 50 mum; soft beam fabrication; standard silicon wafer; test device; Accelerometers; Etching; Fabrication; Microelectromechanical systems; Resists; Silicon; high-aspect-ratio; parylene; silicon etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano/Micro Engineered and Molecular Systems (NEMS), 2011 IEEE International Conference on
Conference_Location
Kaohsiung
Print_ISBN
978-1-61284-775-7
Type
conf
DOI
10.1109/NEMS.2011.6017423
Filename
6017423
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