• DocumentCode
    3282993
  • Title

    New Excimer Laser Annealing Process for Single-Crystal 3-D Stacked Thin-Film Transistors

  • Author

    Xianyu, Wenxu ; Yin, Huaxiang ; Cho, Hans S. ; Zhang, Xiaoxin ; Noguchi, Takashi

  • fYear
    2005
  • fDate
    Dec. 7-9, 2005
  • Firstpage
    82
  • Lastpage
    83
  • Keywords
    Annealing; Crystallization; Epitaxial growth; Insulation; Pulsed laser deposition; Semiconductor films; Silicon on insulator technology; Substrates; Temperature; Thin film transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2005 International
  • Print_ISBN
    1-4244-0083-X
  • Type

    conf

  • DOI
    10.1109/ISDRS.2005.1595988
  • Filename
    1595988
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3282993