• DocumentCode
    3283167
  • Title

    A theoretical study on silicon betavoltaics using Ni-63

  • Author

    Wu, Kai ; Dai, Changhong ; Guo, Hang

  • Author_Institution
    Pen-Tung Sah Micro-Nano Technol. Res. Center, Xiamen Univ., Xiamen, China
  • fYear
    2011
  • fDate
    20-23 Feb. 2011
  • Firstpage
    724
  • Lastpage
    727
  • Abstract
    Theoretical study of silicon betavoltaics is presented in this paper. The analytical expression of generated current is derived and the characteristic parameters are studied. The radioactive isotope Ni-63 is chosen due to its long half-life time about 100.2 years. The betavoltaic microbattery is based on a N+-P silicon junction and the junction depth (xj) is chosen to be the penetration depth of beta particles with the average kinetic energy of 17.4 keV emitted from Ni-63. The effects of doping concentration on short-circuit current density (Jsc), open-circuit voltage (Voc) and conversion efficiency (η) are discussed. By optimizing the doping concentration, high conversion efficiency (5%) betavoltaic microbattery can be achieved.
  • Keywords
    cells (electric); current density; elemental semiconductors; micromechanical devices; p-n junctions; radioisotopes; silicon; average kinetic energy; betavoltaic microbattery; conversion efficiency; doping concentration; efficiency 5 percent; electron volt energy 17.4 keV; n-p silicon junction; open-circuit voltage; radioactive isotope; short-circuit current density; silicon betavoltaic battery; Batteries; Doping; Isotopes; Junctions; Kinetic energy; Neodymium; Silicon; Ni-63; microbattery; silicon betavoltaics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Micro Engineered and Molecular Systems (NEMS), 2011 IEEE International Conference on
  • Conference_Location
    Kaohsiung
  • Print_ISBN
    978-1-61284-775-7
  • Type

    conf

  • DOI
    10.1109/NEMS.2011.6017456
  • Filename
    6017456