DocumentCode
3283167
Title
A theoretical study on silicon betavoltaics using Ni-63
Author
Wu, Kai ; Dai, Changhong ; Guo, Hang
Author_Institution
Pen-Tung Sah Micro-Nano Technol. Res. Center, Xiamen Univ., Xiamen, China
fYear
2011
fDate
20-23 Feb. 2011
Firstpage
724
Lastpage
727
Abstract
Theoretical study of silicon betavoltaics is presented in this paper. The analytical expression of generated current is derived and the characteristic parameters are studied. The radioactive isotope Ni-63 is chosen due to its long half-life time about 100.2 years. The betavoltaic microbattery is based on a N+-P silicon junction and the junction depth (xj) is chosen to be the penetration depth of beta particles with the average kinetic energy of 17.4 keV emitted from Ni-63. The effects of doping concentration on short-circuit current density (Jsc), open-circuit voltage (Voc) and conversion efficiency (η) are discussed. By optimizing the doping concentration, high conversion efficiency (5%) betavoltaic microbattery can be achieved.
Keywords
cells (electric); current density; elemental semiconductors; micromechanical devices; p-n junctions; radioisotopes; silicon; average kinetic energy; betavoltaic microbattery; conversion efficiency; doping concentration; efficiency 5 percent; electron volt energy 17.4 keV; n-p silicon junction; open-circuit voltage; radioactive isotope; short-circuit current density; silicon betavoltaic battery; Batteries; Doping; Isotopes; Junctions; Kinetic energy; Neodymium; Silicon; Ni-63; microbattery; silicon betavoltaics;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano/Micro Engineered and Molecular Systems (NEMS), 2011 IEEE International Conference on
Conference_Location
Kaohsiung
Print_ISBN
978-1-61284-775-7
Type
conf
DOI
10.1109/NEMS.2011.6017456
Filename
6017456
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