• DocumentCode
    3284483
  • Title

    Characterization of Sputtered-TaN metal gate for SiO2 and HfO2 gate dielectrics

  • Author

    Zhao, Yijie ; Eberly, Brandon ; Shang, Huiling ; White, Marvin H.

  • fYear
    2005
  • fDate
    Dec. 7-9, 2005
  • Firstpage
    270
  • Lastpage
    271
  • Keywords
    Capacitance-voltage characteristics; Conductivity; Dielectric measurements; Dielectric substrates; Electrodes; Hafnium oxide; MOS capacitors; Performance evaluation; Semiconductor films; Sputtering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2005 International
  • Print_ISBN
    1-4244-0083-X
  • Type

    conf

  • DOI
    10.1109/ISDRS.2005.1596089
  • Filename
    1596089
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3284483