DocumentCode

329140

Title

A CMOS Dissolved Wafer Process For Integrated P++ Microelectromechanical Systems

Author

Gianchandani, Yogesh B. ; Ma, Karl J. ; Najafi, Khalil

Author_Institution

University of Michigan

Volume

1

fYear

1995

fDate

25-29 Jun 1995

Firstpage

79

Lastpage

82

Keywords

Boron; CMOS process; CMOS technology; Etching; Fabrication; Glass; Integrated circuit technology; Microelectromechanical systems; Microstructure; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Sensors and Actuators, 1995 and Eurosensors IX.. Transducers '95. The 8th International Conference on

Print_ISBN

91-630-3473-5

Type

conf

DOI

10.1109/SENSOR.1995.717093

Filename

717093