DocumentCode
3294765
Title
A Technique for Co Target Discharge Stabilization Using an Ion Gauge in the Sputtering System
Author
Muraoka, Tatsuo ; Kobayashi, Kazunori
Author_Institution
Fujitsu Ltd., Aizuwakamatsu
fYear
2006
fDate
25-27 Sept. 2006
Firstpage
385
Lastpage
386
Abstract
Cobalt sputtering has a disadvantage in the lost operation time resulting from unstable discharge when cobalt is deposited on the shield. We successfully achieved stable discharge by utilizing an ion gauge instead of an igniter, even during sputtering, to supply thermal electrons to the discharge space. This technique doubles productivity.
Keywords
cobalt; sputtering; Co; ion gauge; sputtering system; target discharge stabilization; thermal electrons; Cities and towns; Cobalt; Electrons; Fault location; Manufacturing processes; Pressure measurement; Productivity; Semiconductor device manufacture; Sputtering; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 2006. ISSM 2006. IEEE International Symposium on
Conference_Location
Tokyo
ISSN
1523-553X
Print_ISBN
978-4-9904138-0-4
Type
conf
DOI
10.1109/ISSM.2006.4493114
Filename
4493114
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