DocumentCode
3295114
Title
Optical Solution of Advanced Production Control for Ultrathin Nitrided Gate Oxides
Author
Yoo, Sungchul ; Jiang, Z.M. ; Huang, E. ; Tan, Z.Q. ; Chen, Chi-Chun ; Chan, M.-H. ; Chen, S.-C. ; Liang, M.-S.
Author_Institution
KLA-Tencor Corp., San Jose
fYear
2006
fDate
25-27 Sept. 2006
Firstpage
457
Lastpage
459
Abstract
We present an optical metrology solution based on fab-proven thin film ellipometry system for ultrathin nitrided gate oxide production control in semiconductor manufacturing.
Keywords
semiconductor device manufacture; thin films; advanced production control; fab-proven thin film ellipometry system; optical metrology solution; semiconductor manufacturing; ultrathin nitrided gate oxides; Ellipsometry; Metrology; Monitoring; Nitrogen; Optical films; Optical mixing; Optical refraction; Optical variables control; Pollution measurement; Production control;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 2006. ISSM 2006. IEEE International Symposium on
Conference_Location
Tokyo
ISSN
1523-553X
Print_ISBN
978-4-9904138-0-4
Type
conf
DOI
10.1109/ISSM.2006.4493135
Filename
4493135
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