Physical effect from etching parameters on the Bragg grating waveguide fabricated on porous silicon nanostructure

Author

Radzi, Ahmad Afif Safwan Mohd ; Rusop, Mohamad ; Abdullah, Saifollah

Author_Institution

NANO-SciTech Centre, Univ. Teknol. MARA (UiTM) Malaysia, Shah Alam, Malaysia

fYear

2012

fDate

5-7 Jan. 2012

Firstpage

1

Lastpage

2

Abstract

Multilayer porous silicon has been investigated due to its optical properties which can behave such as Bragg mirror, optical microcavity and Fabry-Perot interferometer. The structure of the fabricated BGW is very much relying on certain parameters during the electrochemical etching process of the bulk crystalline silicon.

Keywords

Bragg gratings; Fabry-Perot interferometers; electrochemical analysis; elemental semiconductors; etching; mirrors; nanophotonics; nanostructured materials; optical fabrication; optical waveguides; porous semiconductors; silicon; Bragg mirror; Fabry-Perot interferometer; Si; bulk crystalline silicon; electrochemical etching; etching parameters; fabricated Bragg grating waveguide structure; multilayer porous silicon nanostructure; optical microcavity; optical properties; Etching; Nonhomogeneous media; Optical device fabrication; Optical refraction; Refractive index; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Enabling Science and Nanotechnology (ESciNano), 2012 International Conference on

Conference_Location

Johor Bahru

Print_ISBN

978-1-4577-0799-5

Type

conf

DOI

10.1109/ESciNano.2012.6149708

Filename

6149708