DocumentCode
3304003
Title
Low phase noise SiGe HBT push-push oscillators for V-band operation
Author
Olbrich, G.R.
Author_Institution
Lehrstuhl fuer Hochfrequenztechnik, Technische Univ. Muenchen, Germany
fYear
2002
fDate
17-19 Aug. 2002
Firstpage
78
Lastpage
81
Abstract
The application of the push-push principle to oscillator design allows the extension of the usable frequency range of transistors for signal generating applications. In this paper, we present several V-band SiGe HBT push-push oscillators using both microstrip transmission line resonators as well as dielectric resonators. The circuits are fabricated in thin film technology on alumina substrates. Measured data of the microstrip transmission line oscillators are an output power of -5.6 dBm and a single sideband phase noise of Lssb (1 MHz) = -98 dBc/Hz as well as +1 dBm and -108 dBc/Hz, respectively. For the dielectric resonator oscillators a maximum output power of -8 dBm and an optimum phase noise of -112 dBc/Hz (-14 dBm output power) were measured.
Keywords
Ge-Si alloys; alumina; dielectric resonator oscillators; heterojunction bipolar transistors; hybrid integrated circuits; integrated circuit noise; microstrip resonators; millimetre wave integrated circuits; millimetre wave oscillators; phase noise; semiconductor materials; thin film circuits; 50 GHz; 57 GHz; 58 GHz; Al2O3; SiGe; SiGe HBT push-push oscillators; V-band operation; alumina substrates; dielectric resonators; low phase noise oscillators; microstrip transmission line resonators; thin film technology; Dielectric substrates; Dielectric thin films; Distributed parameter circuits; Germanium silicon alloys; Heterojunction bipolar transistors; Oscillators; Phase noise; Power generation; Power transmission lines; Silicon germanium;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave and Millimeter Wave Technology, 2002. Proceedings. ICMMT 2002. 2002 3rd International Conference on
Print_ISBN
0-7803-7486-X
Type
conf
DOI
10.1109/ICMMT.2002.1187639
Filename
1187639
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