DocumentCode

330615

Title

Characterization Of Proximity Correction In 0.1 /spl mu/m Regime X-Ray Lithography

Author

Yi, M. ; Seo, E. ; Seo, Y. ; Lee, K. ; Kim, O.

Author_Institution

Pohang University of Science and Technology

fYear

1998

fDate

13-16 July 1998

Firstpage

23

Lastpage

24

Keywords

Delay; Gold; Laboratories; Length measurement; Production; Resists; Shape measurement; Silicon compounds; Testing; X-ray lithography;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

conf

DOI

10.1109/IMNC.1998.729927

Filename

729927