• DocumentCode
    330620
  • Title

    Hydrogen Effects On Heteroepitaxial Growth Of Ge Films On Si

  • Author

    Ikeda, H. ; Muto, A. ; Okada, M. ; Suzumura, I. ; Zaima, S. ; Yasuda, Y.

  • Author_Institution
    Nagoya University
  • fYear
    1998
  • fDate
    13-16 July 1998
  • Firstpage
    33
  • Lastpage
    34
  • Keywords
    Atomic layer deposition; Crystalline materials; Epitaxial growth; Hydrogen; Materials science and technology; Semiconductor films; Solids; Substrates; Surface cleaning; Surface morphology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 1998 International
  • Conference_Location
    Kyoungju, South Korea
  • Print_ISBN
    4-930813-83-2
  • Type

    conf

  • DOI
    10.1109/IMNC.1998.729936
  • Filename
    729936
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=330620