DocumentCode

330628

Title

Process Technology For Next Generation Photomask

Author

Soh, Jung Min ; Choi, Sung Woon ; Kim, Byung Gook ; Kim, Jin Min ; Cha, Byung Cheol ; Yoon, Hee Sun

Author_Institution

Samsung Electronics

fYear

1998

fDate

13-16 July 1998

Firstpage

47

Lastpage

48

Keywords

Acceleration; Dry etching; Electron beams; Error correction; Fluctuations; Linearity; Resists; Throughput; Voltage; Writing;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

conf

DOI

10.1109/IMNC.1998.729953

Filename

729953