• DocumentCode
    330721
  • Title

    Epitaxial Growth Of GaN By HWP(Helicon Wave Plasma) Assisted Metal-Organic CVD (Chemical Vapor Deposition) Process

  • Author

    Kim, Ki-Sung ; Chun, Chan-Wook ; Kim, Seon-Hyo

  • Author_Institution
    Pohang University of Science and Technology
  • fYear
    1998
  • fDate
    13-16 July 1998
  • Firstpage
    233
  • Lastpage
    236
  • Keywords
    Argon; Epitaxial growth; Gallium nitride; Magnetic field measurement; Plasma density; Plasma measurements; Plasma properties; Plasma sources; Plasma temperature; Plasma waves;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 1998 International
  • Conference_Location
    Kyoungju, South Korea
  • Print_ISBN
    4-930813-83-2
  • Type

    conf

  • DOI
    10.1109/IMNC.1998.730059
  • Filename
    730059
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=330721