DocumentCode
330740
Title
Stitching-Error-Free Overlay Metrology For EB Lithography Using "One-Shot" Inspection Target Mark
Author
Asano, Koji ; Takahashi, Kimitoshi ; Nagata, Takep ; Sato, Masami ; Nara, Yasuno
Author_Institution
ULSI Technology Laboratory, Fujitsu Laboratories Ltd.
fYear
1998
fDate
13-16 July 1998
Firstpage
273
Lastpage
274
Keywords
Electron beams; Inspection; Laboratories; Lithography; Manufacturing; Metrology; Petroleum; Reproducibility of results; Ultra large scale integration; Wavelength measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location
Kyoungju, South Korea
Print_ISBN
4-930813-83-2
Type
conf
DOI
10.1109/IMNC.1998.730078
Filename
730078
Link To Document