• DocumentCode
    3318157
  • Title

    Criteria for one-dimensional transport in split-gate field-effect transistors

  • Author

    Eugster, C.C. ; del Alamo, Jesus A. ; Belk, P.A. ; Rooks, M.J.

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., MIT, Cambridge, MA, USA
  • fYear
    1990
  • fDate
    9-12 Dec. 1990
  • Firstpage
    335
  • Lastpage
    338
  • Abstract
    The authors have fabricated AlGaAs-GaAs split-gate field-effect transistors with different lengths and widths in order to establish geometric design criteria for one-dimensional (1D) transport. The experiments show a more negative 1D threshold voltage for zero length split-gate devices (constrictions) than for finite length split-gate devices for the same given width. The experiments reveal the existence of a critical width between the gates below which a 1D regime cannot be supported in split-gate FETs longer than 0.5 mu m.<>
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; 0.5 micron; 1D threshold voltage; AlGaAs-GaAs; MODFET; critical width; field-effect transistors; geometric design criteria; one-dimensional transport; split-gate FETs; FETs; Split gate flash memory cells; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1990. IEDM '90. Technical Digest., International
  • Conference_Location
    San Francisco, CA, USA
  • ISSN
    0163-1918
  • Type

    conf

  • DOI
    10.1109/IEDM.1990.237162
  • Filename
    237162