• DocumentCode
    3320247
  • Title

    Polycrystalline diamond thin film as wide bandgap material: the optoelectronic behaviour and the relationship with the structure

  • Author

    Pereira, L. ; Pereira, E. ; Rodrigues, A. ; Gomes, H.

  • Author_Institution
    Dept. de Fisica, Aveiro Univ., Portugal
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    295
  • Lastpage
    298
  • Abstract
    In this work metal-Microwave Plasma CVD diamond Schottky devices were studied. The current density vs. applied voltage reveals rectification ratios up to 104 at |±2V|. Under illumination an inversion and increase of the rectification is observed. The carrier density is 1015 cm-3 and the ideality factors near 1.5. The dark current vs. temperature shows that below 150 K the bulk transport is controlled by a hopping process with a density of defects of 1016 cm-3. For higher temperatures an extrinsic ionisation with activation energy of 0.3 eV takes place. The correlation with the polycrystalline nature of the samples is reported
  • Keywords
    Schottky diodes; carrier density; crystal structure; current density; dark conductivity; diamond; elemental semiconductors; hopping conduction; plasma CVD; plasma CVD coatings; rectification; semiconductor growth; semiconductor thin films; semiconductor-metal boundaries; wide band gap semiconductors; -2 to 2 V; 0.3 eV; 150 K; C; activation energy; applied voltage; bulk transport; carrier density; current density; dark current; defect density; extrinsic ionisation; hopping process; ideality factors; illumination; inversion; metal/microwave plasma CVD diamond Schottky devices; optoelectronic behaviour; polycrystalline diamond thin film; rectification ratios; structure; wide bandgap material; Charge carrier density; Current density; Lighting; Photonic band gap; Plasma density; Plasma devices; Plasma materials processing; Plasma temperature; Transistors; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconducting and Insulating Materials Conference, 2000. SIMC-XI. International
  • Conference_Location
    Canberra, ACT
  • Print_ISBN
    0-7803-5814-7
  • Type

    conf

  • DOI
    10.1109/SIM.2000.939246
  • Filename
    939246