• DocumentCode
    3328101
  • Title

    Electrical requirements for FED internal support structure

  • Author

    Dunphy, J.C. ; Schropp, D.R., Jr.

  • Author_Institution
    Candescent Technol. Corp., San Jose, CA, USA
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    221
  • Lastpage
    222
  • Abstract
    One of the challenges of developing high voltage FED technology is eliminating distortion of the image near internal support structures or spacers. For the past several years Candescent has demonstrated FEDs with internal spacer structures which are invisible to the user. This achievement began with a thorough understanding of the physics underlying the problem combined with experimental techniques for quantifying it. This paper describes a model and measurements of one of the causes of spacer visibility, charging of the spacer surface by impingement of electrons Rutherford scattered from the faceplate
  • Keywords
    Rutherford backscattering; field emission displays; surface charging; electrical properties; electron Rutherford scattering; faceplate; high-voltage FED technology; image distortion; internal spacer; internal support structure; spacer surface charging; spacer visibility; Anodes; Cathodes; Coatings; Displays; Electron beams; Electron emission; Image analysis; Optical scattering; Surface charging; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
  • Conference_Location
    Davis, CA
  • Print_ISBN
    0-7803-7197-6
  • Type

    conf

  • DOI
    10.1109/IVMC.2001.939733
  • Filename
    939733